MOHAMED, N. M.; KIN YIN, C. Preparation and Surface Analysis of Ultrathin Photoresist for Microlithography. Malaysian Journal of Science, [S. l.], v. 21, p. 141–146, 2002. Disponível em: http://mojes.um.edu.my/index.php/MJS/article/view/8877. Acesso em: 14 nov. 2024.